GTC -- NVIDIA today announced a
breakthrough that brings accelerated computing to the field of
computational lithography, enabling semiconductor leaders like
ASML, TSMC and Synopsys to accelerate the design and manufacturing
of next-generation chips, just as current production processes are
nearing the limits of what physics makes possible.
The new NVIDIA cuLitho software library for computational
lithography is being integrated by TSMC, the world’s leading
foundry, as well as electronic design automation leader Synopsys
into their software, manufacturing processes and systems for the
latest-generation NVIDIA Hopper™ architecture GPUs. Equipment maker
ASML is working closely with NVIDIA on GPUs and cuLitho, and is
planning to integrate support for GPUs into all of its
computational lithography software products.
The advance will enable chips with tinier transistors and wires
than is now achievable, while accelerating time to market and
boosting energy efficiency of the massive data centers that run
24/7 to drive the manufacturing process.
“The chip industry is the foundation of nearly every other
industry in the world,” said Jensen Huang, founder and CEO of
NVIDIA. “With lithography at the limits of physics, NVIDIA’s
introduction of cuLitho and collaboration with our partners TSMC,
ASML and Synopsys allows fabs to increase throughput, reduce their
carbon footprint and set the foundation for 2nm and beyond.”
Running on GPUs, cuLitho delivers a performance leap of up to
40x beyond current lithography — the process of creating patterns
on a silicon wafer — accelerating the massive computational
workloads that currently consume tens of billions of CPU hours
every year.
It enables 500 NVIDIA DGX H100 systems to achieve the work of
40,000 CPU systems, running all parts of the computational
lithography process in parallel, helping reduce power needs and
potential environmental impact.
In the near term, fabs using cuLitho could help produce each day
3-5x more photomasks — the templates for a chip’s design — using 9x
less power than current configurations. A photomask that required
two weeks can now be processed overnight.
Longer term, cuLitho will enable better design rules, higher
density, higher yields and AI-powered lithography.
Support From Industry LeadersNVIDIA is working
with key partners to smooth the speedy adoption of these new
technologies.
“The cuLitho team has made admirable progress on speeding up
computational lithography by moving expensive operations to GPU,”
said Dr. C.C. Wei, CEO of TSMC. “This development opens up new
possibilities for TSMC to deploy lithography solutions like inverse
lithography technology and deep learning more broadly in chip
manufacturing, making important contributions to the continuation
of semiconductor scaling.”
“We are planning to integrate support for GPUs into all of our
computational lithography software products,” said Peter Wennink,
CEO of ASML. “Our collaboration with NVIDIA on GPUs and cuLitho
should result in tremendous benefit to computational lithography,
and therefore to semiconductor scaling. This will be especially
true in the era of high NA extreme ultraviolet lithography.”
“Computational lithography, specifically optical proximity
correction, or OPC, is pushing the boundaries of compute workloads
for the most advanced chips,” said Aart de Geus, chair and CEO of
Synopsys. “By collaborating with our partner NVIDIA to run Synopsys
OPC software on the cuLitho platform, we massively accelerated the
performance from weeks to days! The team-up of our two leading
companies continues to force amazing advances in the industry.”
Enabling Semiconductor ScalingThe cost of the
computational time needed for the largest workloads in semi
manufacturing has in recent years been outpacing Moore’s law, due
to both the larger number of transistors in newer nodes and more
stringent accuracy requirements. Future nodes require more detailed
calculations, not all of which can feasibly fit into the available
computational bandwidth provided by the current platforms, slowing
the pace of innovation in semiconductors.
A fab process change often requires an OPC revision, creating
bottlenecks. cuLitho helps remove these bottlenecks, and it makes
possible novel solutions and innovative techniques like curvilinear
masks, high NA EUV lithography, and sub-atomic photoresist modeling
needed for new technology nodes.
To learn more, watch Huang’s GTC 2023 keynote and attend the
conference session “Accelerating Computational Lithography”
presented by NVIDIA cuLitho architect Vivek K. Singh. Registration
for GTC is free.
About NVIDIASince its founding in 1993, NVIDIA
(NASDAQ: NVDA) has been a pioneer in accelerated computing. The
company’s invention of the GPU in 1999 sparked the growth of the PC
gaming market, redefined computer graphics, ignited the era of
modern AI and is fueling the creation of the metaverse. NVIDIA is
now a full-stack computing company with data-center-scale offerings
that are reshaping industry. More information at
https://nvidianews.nvidia.com/.
For further information, contact:Liz
ArchibaldCorporate Communications NVIDIA Corporation
larchibald@nvidia.com
Certain statements in this press release including, but not
limited to, statements as to: the benefits, impact, availability
and performance of our products and technologies, including cuLitho
software library, NVIDIA Hopper architecture GPUs and NVIDIA DGX
H100 systems; the benefits, impact, performance, availability and
progress of integration of cuLitho software library by and
collaboration with third-parties, including ASML, TSMC and
Synopsys; NVIDIA working with key partners to smooth the speedy
adoption of cuLitho software library are forward-looking statements
that are subject to risks and uncertainties that could cause
results to be materially different than expectations. Important
factors that could cause actual results to differ materially
include: global economic conditions; our reliance on third parties
to manufacture, assemble, package and test our products; the impact
of technological development and competition; development of new
products and technologies or enhancements to our existing product
and technologies; market acceptance of our products or our
partners’ products; design, manufacturing or software defects;
changes in consumer preferences or demands; changes in industry
standards and interfaces; unexpected loss of performance of our
products or technologies when integrated into systems; as well as
other factors detailed from time to time in the most recent reports
NVIDIA files with the Securities and Exchange Commission, or SEC,
including, but not limited to, its annual report on Form 10-K and
quarterly reports on Form 10-Q. Copies of reports filed with the
SEC are posted on the company’s website and are available from
NVIDIA without charge. These forward-looking statements are not
guarantees of future performance and speak only as of the date
hereof, and, except as required by law, NVIDIA disclaims any
obligation to update these forward-looking statements to reflect
future events or circumstances.
© 2023 NVIDIA Corporation. All rights reserved. NVIDIA, the
NVIDIA logo, and NVIDIA Hopper are trademarks and/or registered
trademarks of NVIDIA Corporation in the U.S. and other countries.
Other company and product names may be trademarks of the respective
companies with which they are associated. Features, pricing,
availability, and specifications are subject to change without
notice.
A photo accompanying this announcement is available at
https://www.globenewswire.com/NewsRoom/AttachmentNg/1a1c3153-f17d-44ba-8fbf-345681f27bc2
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