MYK Mykrolis Corp

Mykrolis Showcases Advanced Product Innovations from CMP Division at SEMICON West Leading Technologies Used for Enhanced Post-CMP Wafer Cleaning, Polishing and Guarding Against Wafer Defects BILLERICA, Mass., July 11 /PRNewswire-FirstCall/ -- Mykrolis Corporation (NYSE:MYK), a leading supplier of components and subsystems to the semiconductor industry, will showcase several innovative products and technologies from its Chemical Mechanical Planarization (CMP) division at SEMICON West (Booth #710/South Hall) in San Francisco from July 12-14, 2005. "The Mykrolis CMP products showcased at SEMICON West this year demonstrate the most advanced technologies for removing large, defect-causing particles without removing the smaller 'working' particles needed for CMP applications," said Christopher Wargo, director of the CMP business at Mykrolis. "By working closely with our OEM and end-user customers, we identify ways to continuously enhance and refine our CMP product line, helping them to meet the most challenging needs in today's complex CMP processes." The following product innovations from Mykrolis's CMP division will be on display at SEMICON West this year: * Solaris(R) DVP Dual Transducer Manifold -- Offers rapid, clean and safe filter changeout in seconds without the use of tools, limiting the handling of hazardous chemicals during installation and disposal processes. * Planarcore(R) polyvinyl acetal (PVA) brushes -- Brushes that have a unique "integrally molded" design to provide greater consistency and improved performance in post-CMP cleaning and polishing applications. As a result, brush changeout is much faster and brush performance is much more consistent. * Planarcap(TM) -- Disposable filters provide high retention, long life and application specific technology for CMP filtration. The Planarcap LPX series is specifically designed to meet the challenges of silica and alumina abrasives typically used for oxide CMP and copper CMP applications. The Planarcap TPX series is specifically designed for ceria applications that typically have smaller abrasive particles at lower concentrations. * Planargard(R) CS 0.2 -- Micron filters are designed to meet the needs of next generation copper and ILD slurries. The filters remove only particles that are disruptive to the CMP process. The particle size distribution of the desired slurry particles does not change after filtration. As a result, consistent slurry is delivered to the process. About Mykrolis Mykrolis is a worldwide developer, manufacturer and supplier of liquid and gas delivery systems, components and consumables used to precisely measure, deliver, control and purify the process liquids, gases and chemicals, as well as the deionized water, photoresists and vacuum systems utilized in the semiconductor manufacturing process. In addition, the Company's products are used to manufacture a range of other products, such as flat panel displays, high purity chemicals, photoresists, solar cells, gas lasers, optical disks and fiber optic cables. Based in Billerica, Massachusetts, Mykrolis is formerly Millipore Microelectronics, Inc. For more information, visit http://www.mykrolis.com/. Mykrolis, Solaris, Planarcore, and Planargard are registered trademarks of Mykrolis. Planarcap and the Mykrolis logo are trademarks of Mykrolis Corporation. PRESS CONTACT: Craig Lazinsky Mykrolis Corporation Tel. 978-436-6743 DATASOURCE: Mykrolis Corporation CONTACT: Craig Lazinsky of Mykrolis Corporation, +1-978-436-6743, Web site: http://www.mykrolis.com/

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